Control and detection of various gases is essential for semiconductor fabrication or Chemical Vapor Deposition (CVD) processes.
In semiconductor fabrication, various etchants can be measured using NDIR technology, and the measurement can be used for process control. In CVD processes, e.g. Metal-Organic Chemical Vapor Deposition (MOCVD), NDIR detection can be used for precursor delivery systems.
NDIR is a preferred detection method for gases absorbing in the mid IR range, delivering high detectivity and stable measurement performance over time.
Advantages of Axetris Infrared Sources :
- High emission at 4.26μm
- Small size
- Fast electrical modulation (Modulation frequency: >10Hz)
- High modulation depth
- Low power consumption
- Long lifetime
Axetris offers solutions by providing a portfolio of IR sources with several reflector with /or without integrated windows (BaF2, CaF2, GeART100).